Electronic component

ABSTRACT

An electronic component includes an electronic element and an interposer board. The electronic element includes a multilayer body and external electrodes at a pair of multilayer body end surfaces of the multilayer body and connected to internal electrode layers. The interposer board includes board end surfaces, board side surfaces orthogonal to the board end surfaces, and board main surfaces orthogonal to the board end surfaces and the board side surfaces. One of the board main surfaces is located in a vicinity of the electronic element and joined with one of the multilayer body main surfaces in a vicinity of the interposer board. The interposer board is an alumina board. A mark portion is provided on one of the board main surfaces.

CROSS REFERENCE TO RELATED APPLICATIONS

This application claims the benefit of priority to Japanese PatentApplication No. 2021-091542 filed on May 31, 2021. The entire contentsof this application are hereby incorporated herein by reference.

BACKGROUND OF THE INVENTION 1. Field of the Invention

The present invention relates to an electronic component.

2. Description of the Related Art

Japanese Unexamined Patent Application Publication No 2004-134430discloses an electronic component in which, in order to reduce thegeneration of noise by reducing the propagation of vibrations, a singleinterposer board including a glass epoxy resin as a main material isprovided at the lower portion of an electronic element which functionsas a main body portion of the multilayer capacitor.

However, in recent years, there has been demand for an electroniccomponent including an interposer board that is more resistant todeflection than an interposer board made of glass epoxy resin.

SUMMARY OF THE INVENTION

Preferred embodiments of the present invention provide electroniccomponents, each including an interposer board resistant to deflection.

An electronic component according to a preferred embodiment of thepresent invention includes an electronic element, and an interposerboard, wherein the electronic element includes a rectangular orsubstantially rectangular multilayer body including dielectric layersand internal electrode layers which are alternately laminated, a pair ofmultilayer body end surfaces orthogonal or substantially orthogonal tothe internal electrode layers, a pair of multilayer body side surfacesorthogonal or substantially orthogonal to the multilayer body endsurfaces, and a pair of multilayer body main surfaces orthogonal orsubstantially orthogonal to the multilayer body end surfaces and themultilayer body side surfaces, and external electrodes each on arespective one of the pair of multilayer body end surfaces of themultilayer body and connected to the internal electrode layers, theinterposer board includes a pair of board end surfaces, a pair of boardside surfaces orthogonal or substantially orthogonal to the board endsurfaces, and a pair of board main surfaces orthogonal or substantiallyorthogonal to the board end surfaces and the board side surfaces, one ofthe pair of board main surfaces is located in a vicinity of theelectronic element and joined with one of the pair of multilayer bodymain surfaces in a vicinity of the interposer board, the interposerboard is an alumina board, and a mark is provided on one of the pair ofboard main surfaces.

According to preferred embodiments of the present invention, it ispossible to provide electronic components, each including an interposerboard resistant to deflection.

The above and other elements, features, steps, characteristics andadvantages of the present invention will become more apparent from thefollowing detailed description of the preferred embodiments withreference to the attached drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a perspective view of an electronic component 1 according to apreferred embodiment of the present invention mounted on a circuit board90.

FIG. 2 is a partial enlarged cross-sectional view of the electroniccomponent 1 according to a preferred embodiment of the presentinvention.

FIG. 3 is an enlarged view of a region P shown in FIG. 2 .

FIG. 4A is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4B is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4C is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4D is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4E is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4F is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4G is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 4H is a diagram of a method of manufacturing an interposer board 20according to a preferred embodiment of the present invention.

FIG. 5 is a flowchart of the method of manufacturing the interposerboard 20 according to a preferred embodiment of the present invention.

FIG. 6A is a diagram of a method of attaching the interposer board 20and an electronic element 10 according to a preferred embodiment of thepresent invention.

FIG. 6B is a diagram of a method of attaching the interposer board 20and an electronic element 10 according to a preferred embodiment of thepresent invention.

FIG. 6C is a diagram of a method of attaching the interposer board 20and an electronic element 10 according to a preferred embodiment of thepresent invention.

FIG. 6D is a diagram of a method of attaching the interposer board 20and an electronic element 10 according to a preferred embodiment of thepresent invention.

FIG. 7 is a flowchart of a method of attaching the interposer board 20and the electronic element 10 according to a preferred embodiment of thepresent invention.

FIG. 8 is a diagram of a method of holding an interposer board 20 by anelastic body holder 201 according to another preferred embodiment of thepresent invention.

FIG. 9 is a view of a method of holding the interposer board 20 by aholder 301 including an adhesive film 303 according to another preferredembodiment of the present invention.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS

Preferred embodiments of the present invention will be described belowwith reference to the drawings.

First Preferred Embodiment

FIG. 1 is a perspective view of an electronic component according to afirst preferred embodiment of the present invention mounted on a circuitboard 90. FIG. 2 is a partial enlarged cross-sectional view of theelectronic component 1 according to the first preferred embodiment ofthe present invention. The electronic component 1 includes an electronicelement 10 and an interposer board 20. The interposer board 20 isattached to the electronic element 10. The electronic component 1 ismounted on the circuit board 90. The circuit board 90 includes lands 91on a surface thereof. The lands 91 are each connected to the interposerboard 20.

Electronic Element 10

The electronic element 10 is, for example, a capacitor in the presentpreferred embodiment of the present invention, but is not limitedthereto. The electronic element 10 may be, for example, an inductor, athermistor, a piezoelectric, or a semiconductor or other elements. Theelectronic element 10 of the present preferred embodiment of the presentinvention includes a multilayer body 13 and a pair of externalelectrodes 14. The multilayer body 13 includes a rectangular orsubstantially rectangular parallelepiped shape. In the multilayer body13, dielectric layers 11, and internal electrode layers 12 arealternately laminated. The pair of external electrodes 14 are providedon both end surfaces of the multilayer body 13.

Multilayer Body 13

The multilayer body 13 has a rectangular or substantially rectangularshape. The multilayer body 13 includes a pair of multilayer body endsurfaces CS orthogonal or substantially orthogonal to the internalelectrode layer 12, a pair of multilayer body side surfaces BSorthogonal or substantially orthogonal to the multilayer body endsurface CS, and a pair of multilayer body main surfaces AS orthogonal orsubstantially orthogonal to the multilayer body end surface CS and themultilayer body side surface BS.

The electronic element 10 of the present preferred embodiment of thepresent invention is a horizontal mounting electronic element. In thehorizontal mounting electronic element, the dielectric layers 11 and theinternal electrode layers 12 are provided in parallel or substantiallyin parallel with the multilayer body main surface AS. However, thepresent invention is not limited to the horizontal mounting electronicelement. The electronic element 10 of the present preferred embodimentof the present invention may be a vertical mounting electronic element.In the vertical mounting electronic element, the dielectric layers 11and the internal electrode layers 12 are provided perpendicular orsubstantially perpendicular to the multilayer body main surface AS.

Dielectric Layer 11

The dielectric layers 11 each mainly include, for example, bariumtitanate or other components. However, the main component of thedielectric layers 11 is not limited to barium titanate. The maincomponent of the dielectric layer 11 may include a ceramic having a highdielectric constant, such as, for example, calcium titanate or strontiumtitanate. The dielectric layers 11 may include at least one kind ofsub-component such as, for example, Mn compounds, Fe compounds, Crcompounds, Co compounds and Ni compounds. Furthermore, the dielectriclayers 11 may include, for example, Si, glass components, and othercomponents.

Internal Electrode Layer 12

The internal electrode layers 12 are provided by printing a pasteincluding, for example, Ni on a ceramic sheet of the dielectric layers11. However, the main material of the internal electrode layers 12 isnot limited to Ni. The main material of the internal electrode layers 12may include an alloy of Pd and Ag, for example.

External Electrodes 14

The external electrodes 14 are respectively provided on the pair ofmultilayer body end surfaces CS of the multilayer body 13. The externalelectrodes 14 each cover not only the multilayer body end surface CS,but also the multilayer body main surface AS and the multilayer bodyside surface BS in a vicinity of the multilayer body end surface CS.

As shown in FIG. 2 , in the internal electrode layers 12, an internalelectrode layer 12 a and an internal electrode layer 12 b are adjacentand oppose each other. The internal electrode layer 12 a is electricallyconnected to one of the external electrodes 14 provided on one of themultilayer body end surfaces CS. The internal electrode layer 12 b iselectrically connected to the other one of the external electrodes 14provided on the other one of the multilayer body end surface CS.

In the following description, the direction extending from one of themultilayer body end surfaces CS of the electronic element 10 to theother one of the multilayer body end surfaces CS is defined as thelength direction L. The direction extending from one of the multilayerbody side surfaces BS of the electronic element 10 to the other one ofthe multilayer body side surfaces BS is defined as the width directionW. The direction extending from one of the multilayer body main surfacesAS of the electronic element 10 to the other one of the multilayer bodymain surfaces AS is defined as the thickness direction T.

Size of Electronic Element 10

In the electronic element 10, the distance between the pair ofmultilayer body end surfaces CS is defined as the length LS. Thedistance between the pair of multilayer body side surfaces BS is definedas the width WS. The distance between a pair of multilayer body mainsurfaces AS is defined as the thickness TS. In this case, in theelectronic element 10 of the present preferred embodiment of the presentinvention, for example, the length LS is about 2.01 mm to about 2.20 mm,the width WS is about 1.30 mm to about 1.50 mm, and the thickness TS isabout 1.70 mm to about 1.9 mm. The thickness of each of the dielectriclayers 11 is preferably about 0.4 μm to about 0.8 μm, and may be about0.4 μm to about 1.0 μm, for example. The thickness of each of theinternal electrode layers 12 is preferably about 0.4 μm to about 0.8 μm,and may be about 0.4 μm to about 1.0 μm, for example.

However, the present invention is not limited thereto, and other sizesmay be used. For example, in the electronic element 10, for example, thelength LS may be about 3.1 mm to about 3.3 mm, the width WS may be about1.5 mm to about 2.7 mm, and the thickness TS may be about 1.5 mm toabout 2.7 mm. In this case, the thickness of each of the dielectriclayers 11 is preferably about 0.4 μm to about 0.8 μm, and may be about0.4 μm to about 1.0 μm, for example. The thickness of each of theinternal electrode layers 12 is preferably about 0.4 μm to about 0.8 μm,and may be about 0.4 μm to about 1.0 μm, for example.

As shown in FIG. 2 , the external electrodes 14 each include, forexample, from the side of the multilayer body end surface CS, a Cu(copper) electrode layer 14 a, an electrically conductive resin layer 14b provided on the outer periphery of the Cu electrode layer 14 a, a Ni(nickel) plated layer 14 c provided on the outer periphery of theelectrically conductive resin layer 14 b, and a first Sn (tin) platedlayer 30 provided on the outer periphery of the Ni plated layer 14 c.

Cu Electrode Layer 14 a

The Cu electrode layer 14 a is provided by, for example, applying andbaking a conductive paste including a conductive metal and glass. The Cuelectrode layer 14 a covers not only the multilayer body end surfaces CSon both sides of the multilayer body 13, but also a portion of themultilayer body main surface AS in the vicinity of the multilayer bodyend surface CS, and a portion of the multilayer body side surface BS inthe vicinity of the multilayer body end surface CS.

Electrically Conductive Resin Layer 14 b

The electrically conductive resin layer 14 b covers the Cu electrodelayer 14 a at the outer periphery of the Cu electrode layer 14 a. Theelectrically conductive resin layer 14 b may include, for example, athermosetting resin and a metal component.

As the thermosetting resin, various known thermosetting resins can beused. Specific examples of the thermosetting resin include, for example,epoxy resin, phenolic resin, urethane resin, silicone resin, andpolyimide resin. As the metal component, for example, Ag or a metalpowder coated with Ag on the surface of the base metal powder can beused. Similarly to the Cu electrode layer 14 a, the electricallyconductive resin layer 14 b also covers not only the multilayer body endsurface CS on both sides of the multilayer body 13, but also a portionof the multilayer body main surface AS in the vicinity of the multilayerbody end surface CS and a portion of the multilayer body side surface BSin the vicinity of the multilayer body end surface CS.

The electrically conductive resin layer 14 b includes, for example, athermosetting resin. For this reason, the electrically conductive resinlayer 14 b is more flexible than, for example, a metal layer made of aplated film or a fired product of a conductive paste. Therefore, evenwhen an impact caused by physical shock or thermal cycling acts on theelectronic component 1, the electrically conductive resin layer 14 bdefines and functions as a buffer layer. Thus, cracks in the electroniccomponent 1 are prevented from occurring. Furthermore, it is easy toabsorb piezoelectric vibration, and it is possible to reduce or preventthe “noise”.

Gap 14 d

A gap 14 d is provided between the Cu electrode layer 14 a and theelectrically conductive resin layer 14 b. In the gap 14 d, the distanced in the length direction L between the Cu electrode layer 14 a and theelectrically conductive resin layer 14 b is largest at the middleportion in the width direction W and the thickness direction T in themultilayer body end surface CS where the Cu electrode layer 14 a isprovided. Furthermore, the distance between the Cu electrode layer 14 aand the electrically conductive resin layer 14 b decreases approachingthe end portion of the multilayer body end surface CS in the vicinity ofthe multilayer body main surface AS or the multilayer body side surfaceBS. Furthermore, the gap 14 d is eliminated or substantially eliminatedat the corner portion and the ridgeline portion. As a result, the Cuelectrode layer 14 a and the electrically conductive resin layer 14 bare in contact with each other. Thus, the distance d in the lengthdirection L of the gap 14 d is largest at the middle portion of thewidth direction W and the thickness direction T in the multilayer bodyend surface CS. Therefore, the external electrodes 14 each have a shapethat bulges toward the length direction L.

Ni Plated Layer 14 c

The Ni plated layer 14 c covers the electrically conductive resin layer14 b at the outer periphery of the electrically conductive resin layer14 b. The Ni plated layer 14 c includes, for example, plating of Ni oran alloy including Ni. Similarly to the Cu electrode layer 14 a, the Niplated layer 14 c covers not only the multilayer body end surface CS onboth sides of the multilayer body 13, but also a portion of themultilayer body main surface AS in the vicinity of the multilayer bodyend surface CS, and a portion of the multilayer body side surface BS inthe vicinity of the multilayer body end surface CS.

First Sn Plated Layer 30

The first Sn plated layer 30 is provided at the outer periphery of theNi plated layer 14 c. The first Sn plated layer 30 includes, forexample, plating of Sn or an alloy including Sn. The first Sn platedlayer 30 may be a single layer. Although described later, the first Snplated layer 30 integrally covers the outer periphery including themetal layer of the interposer board 20 with the interposer board 20attached to the electronic element 10. The first Sn plated layer 30 mayinclude, for example, two Sn-plated layers. In this case, the first Snplated layer 30 may include, for example, a Sn plated layer coveringonly the Ni plated layer 14 c of the electronic element 10 withoutcovering the interposer board 20, between the Ni plated layer 14 c andthe first Sn plated layer 30.

Interposer Board 20

The interposer board 20 is a rectangular or substantially rectangularplate member. The interposer board 20 includes a pair of board endsurfaces CK, a pair of board side surfaces BK perpendicular orsubstantially perpendicular to the board end surface CK, and a pair ofboard main surfaces AK perpendicular or substantially perpendicular tothe board end surface CK and the board side surface BK. The pair ofboard end surfaces CK each include a recess 21. A board main surface AK1in the vicinity of the electronic element which is one of the pair ofboard main surfaces AK is joined with a multilayer body main surface AS2in the vicinity of the board which is one of the pair of multilayer bodymain surfaces AS of the electronic element 10.

Material

The interposer board 20 is, for example, an alumina board made ofalumina. Alumina is generally harder than epoxy resin or the like, whichis a common material for insulation boards. Therefore, it is possible toprovide an electronic component including an interposer board 20 that isresistant to deflection. In addition, alumina is harder than epoxy resinor the like. This is also effective in reducing or preventing the noise.

Size

In the following, in the interposer board 20, the length between thepair of board end surfaces CK is defined as LK. The width between thepair of board side surfaces BK is defined as WK. The thickness betweenthe pair of board main surfaces AK is defined as TK. The length LKbetween the pair of board end surfaces CK refers to a length between thepair of board end surfaces CK other than the portion where the recess 21is provided, in the board end surface CK.

The width WK of the interposer board 20 is smaller than the width WS ofthe electronic element 10. The length LK of the interposer board 20 issmaller than the length LS of the electronic element 10. Therefore, theentire interposer board 20 is covered by the electronic element 10 in aplan view. Therefore, when mounting the interposer board 20 of theelectronic component 1 on the circuit board 90, the arrangement is notlimited due to the size of the interposer board 20. Furthermore, theinterposer board 20 is not visible in a plan view. For this reason, ithas excellent aesthetics.

Recess 21

Each of the pair of board end surfaces CK of the interposer board 20includes a recess 21. The recess 21 has a semi-elliptical orsubstantially semi-elliptical shape in a plan view as shown in FIG. 1 .By providing the recess 21, it is possible to accumulate a solder layer40 to join the lands 91 of the electronic component 1 and the circuitboard 90, in a space provided by the recess 21. Thus, it is possible toreduce or prevent wetting of the solder layer 40 on the end surface inthe length direction L of the electronic element 10.

The shape in a plan view of the recess 21 is not limited to asemi-elliptical shape, and may be, for example, a polygonal orsubstantially polygonal shape or other shapes. However, for the purposeof increasing the area where the solder layer 40 is wetted whilemaintaining the bonding strength between the electronic element 10 andthe interposer board 20, the shape of the recess 21 in a plan view ispreferably semi-elliptical or substantially semi-elliptical. Such asemi-elliptical or substantially semi-elliptical shape is obtained bydividing the ellipse or an approximate ellipse having a main axisparallel or substantially parallel to the width direction W of theinterposer board 20 along this main axis.

Cu Fired layer 23

The Cu fired layer 23 is provided on the board main surface AK of theinterposer board 20 in the vicinity of the board end surface CK. By theCu fired layer 23 being provided in this way, the adhesion force of theCu plated layer provided on the outer periphery of the Cu fired layer 23to the board main surface AK of the interposer board 20 is improved.

In the present preferred embodiment of the present invention, the Cufired layer 23 is provided on both sides of the board main surface AK1in the vicinity of the electronic element and the board main surface AK2in the vicinity of the circuit board. The Cu fired layer 23 provided onthe board main surface AK2 in the vicinity of the circuit board may bethinner than the Cu fired layer 23 provided on the board main surfaceAK1 in the vicinity of the electronic element.

The Cu fired layer 23 may be thinner from the board end surface CKtoward the middle portion along the length direction L on the board mainsurface AK. Therefore, when mounting the electronic element 10 usingsolder 40A, the posture of the electronic element 10 is easilystabilized.

Diffusion Layer 24

Furthermore, the Cu fired layer 23 is provided on the board main surfaceAK of the interposer board 20 in the vicinity of the board end surfaceCK. Thus, on the board main surface AK of the interposer board 20 in thevicinity of the board end surface CK, the diffusion layer 24 including,for example, aluminum and Cu is provided between the Cu layer 27 and theinterposer board 20 made of alumina.

Mark Portion 25

As shown in FIG. 2 , a mark portion 25 is provided which includes, forexample, Si at the middle portion in the length direction L and thewidth direction W of the board main surface AK of the interposer board20. The mark portion 25 may be made of, for example, glass. The markportion 25 may include, for example, Si and alumina. Since the markportion 25 includes alumina, it is firmly attached to the interposerboard 20 made of alumina. The mark portion 25 may be thinner than the Cufired layer 23. Therefore, when mounting the electronic element 10 tothe interposer board 20, the mark portion 25 provided at the middleportion in the length direction L and the width direction W does notcontact the electronic element 10. Thus, the mounting of the electronicelement 10 does not become unstable. The mark portion 25 is circular orsubstantially circular in the present preferred embodiment. However, thepresent invention is not limited thereto, and may be, for example, oval,substantially oval, triangular, or substantially triangular.

Furthermore, in the present preferred embodiment, the mark portion 25 isprovided on the board main surface AK1 in the vicinity of the electronicelement. As described above, the Cu fired layer 23 provided on the boardmain surface AK1 in the vicinity of the electronic element may bethicker than the Cu fired layer 23 provided on the board main surfaceAK2 in the vicinity of the circuit board.

Among the board main surfaces AK of the interposer board 20, the boardmain surface AK1 in the vicinity of the electronic element is attachedto the electronic element 10. The board main surface AK1 in the vicinityof the electronic element includes the thicker Cu fired layer 23thereon. However, the difference in thickness of the Cu fired layers 23may be small. Therefore, the board main surface AK2 in the vicinity ofthe circuit board and the board main surface AK1 in the vicinity of theelectronic element may be visually indistinguishable from each otherwhen visually viewing the Cu fired layers 23. However, in the presentpreferred embodiment of the present invention, the mark portion 25 isprovided on the main surface AK1 in the vicinity of the electronicelement. As a result, the mark portion 25 defines and functions as amark to identify the board main surface AK1 in the vicinity of theelectronic element on which the Cu fired layer 23 is thicker. Thus, itis possible to attach the board main surface AK1 in the vicinity of theelectronic element where the Cu fired layer 23 is thicker to theelectronic element 10.

However, the present invention is not limited thereto. The mark portion25 may be provided on the board main surface AK2 in the vicinity of thecircuit board. When joining the electronic element 10 and the interposerboard 20, there are cases where alignment using a camera is performed.In these cases, photographing is performed from the side of theinterposer board 20. When the mark portion 25 is provided on the boardmain surface AK2 in the vicinity of the circuit board, the mark portion25 is visible during the alignment using a camera. Therefore, thealignment is easily performed.

Zn-Containing Layer 26

The pair of board end surfaces CK of the interposer board 20 eachinclude a Zn-containing layer 26 including Zn (zinc).

Metal Layer

The outer periphery of the Cu fired layer 23 and the Zn-containing layer26 on the interposer board 20 in the vicinity of the board end surfaceCK includes a metal layer thereon. The metal layer includes, forexample, a Cu layer 27, a Ni plated layer 28, and a second Sn platedlayer 29.

Cu Layer 27

In the present preferred embodiment, the Cu layer 27 is, for example, aCu plated layer. However, the present invention is not limited thereto.For example, a paste may be applied to the Cu layer 27. The Cu layer 27covers not only the board end surfaces CK on both sides of theinterposer board 20, but also a portion of the board main surface AK inthe vicinity of the board end surface CK, and a portion of the boardside surface BK in the vicinity of the board end surface CK.

Ni Plated Layer 28

The Ni plated layer 28 is provided on the outer periphery of the Culayer 27. The Ni plated layer 28 covers the Cu layer 27. The Ni platedlayer 28 may include, for example, plating of Ni or an alloy includingNi. Similarly to the Cu layer 27, the Ni plated layer 28 covers not onlythe board end surfaces CK on both sides of the interposer board 20, butalso a portion of the board main surface AK in the vicinity of the boardend surface CK and a portion of the board side surface BK in thevicinity of the board end surface CK. Furthermore, the externalelectrodes 14 each include the Ni plated layer 14 c. However, the Niplated layer 14 c of the external electrode 14 is not connected to theNi plated layer 28 of the interposer board 20.

Second Sn Plated Layer 29

The second Sn plated layer 29 is provided on the outer periphery of theNi plated layer 28. The second Sn plated layer 29 covers the Ni platedlayer 28. The second Sn plated layer 29 includes, for example, platingof Sn or an alloy including Sn. Similarly to the Cu layer 27, the secondSn plated layer 29 covers not only the board end surfaces CK on bothsides of the interposer board 20, but also a portion of the board mainsurface AK in the vicinity of the board end surface CK and a portion ofthe board side surface BK in the vicinity of the board end surface CK.

First Sn Plated Layer 30

The first Sn plated layer 30 is provided on the outer periphery ofsecond Sn plated layer 29. As described above, the first Sn plated layer30 covers both the external electrode 14 of the electronic element 10and the metal layer of the interposer board 20. The first Sn platedlayer 30 is provided over the metal layer of the board end surface CK ofthe interposer board 20 from the external electrode 14 of the electronicelement 10. Therefore, the first Sn plated layer 30 seamlessly connectsthe land 91 of the circuit board 90 and the external electrode 14 of theelectronic element 10. As a result, excellent conductivity can beensured.

Notch 22

FIG. 3 is an enlarged view of a region P shown in FIG. 2 . Notches 22are provided in the surface of the interposer board 20 in the vicinityof the board end surface CK. One or more of the notches 22 may beprovided in a predetermined region. This region may include the boardend surface CK, the board side surface BK in the vicinity of the boardend surface CK, the board main surface AK in the vicinity of the boardend surface CK, the ridge portion between the board end surface CK andthe board side surface BK, the ridge portion between the board endsurface CK and the board main surface AK, the ridge portion between theboard side surface BK and the board main surface AK, and the cornerportion among the board end surface CK, the board side surface BK, andthe board main surface AK.

Advantageous Effects of Notch 22

The Cu fired layer 23, the Cu layer 27, the Ni plated layer 28, thesecond Sn plated layer 29, the first Sn plated layer 30, or the likeprovided on the outer periphery of the interposer board 20 may enter theinterior of the notches 22 provided in the interposer board 20.Depending on the shape, position, depth, or size of the notch 22, thenumber and type of layers that enter may vary. Thus, the Cu fired layer23, the Cu layer 27, the Ni plated layer 28, the second Sn plated layer29, the first Sn plated layer 30, or the like enters the notches 22,which provides an anchoring effect. Due to the anchoring effect, it ispossible to increase the adhesive force of the Cu fired layer 23, the Culayer 27, the Ni plated layer 28, the second Sn plated layer 29, and thefirst Sn plated layer 30, to the interposer board 20.

Solder Layer 40

The solder layer 40 is provided between the electronic element 10 andthe interposer board 20. The solder layer 40 joins the electronicelement 10 and the interposer board 20. The solder layer 40 may be, forexample, a Sn cream solder layer. The Sn cream solder layer may includea flux including, for example, a rosin, an activator, or a solvent. Thesolder layer 40 is provided between the external electrode 14 on themultilayer body main surface AS2 in the vicinity of the board of theelectronic element 10, and a portion where the diffusion layer 24, theCu fired layer 23, the Cu layer 27, the Ni plated layer 28, and thesecond Sn plated layer 29 on the board main surface AK1 in the vicinityof the electronic element of the interposer board 20 are provided.

The solder layer 40 may include a solder unfilled region 41. In thesolder unfilled region 41, the solder is not filled. The solder unfilledregion 41 includes a cavity region 41A and a flux region 41B, forexample. The cavity region 41A may include, for example, air. The fluxregion 41B may include, for example, flux. The flux may be, for example,a rosin, an activator, or a solvent included in the Sn cream solder. Thesolder layer 40 includes the solder unfilled region 41 such as thecavity region 41A and the flux region 41B. With such a configuration,cushioning properties can be provided between the electronic element 10and the interposer board 20. As a result, it is possible to reduce thetransmission of impact to the electronic element 10 when an impact isapplied to the circuit board 90. Furthermore, beads or the like having acushioning property may be mixed into the Sn cream solder. This mayprovide a cushioning region 41C as the solder unfilled region 41.

Advantageous Effects of Interposer Board 20

As described above, the electronic component 1 in which the electronicelement 10 and the interposer board 20 are joined is mounted on thecircuit board 90. Thus, the electronic element 10 and the circuit board90 sandwich the interposer board 20 such that the electronic element 10and the circuit board 90 are connected to each other. The vibrationgenerated from the electronic element 10 is attenuated when propagatingthrough the interposer board 20. Thus, it is possible to reduce orprevent the audible sound generated by the vibration propagating to thecircuit board 90.

Manufacturing Method

Next, a non-limiting example of a manufacturing method of the electroniccomponent 1 according to the present preferred embodiment of the presentinvention will be described. The method of manufacturing the electroniccomponent 1 includes a method of manufacturing the interposer board 20and a method of attaching the interposer board 20 and the electronicelement 10. FIGS. 4A-4H are diagrams of a non-limiting example of amethod of manufacturing the interposer board 20. FIG. 5 is a flowchartof such a method of manufacturing the interposer board 20.

Board Preparing Process

First, an elongated alumina board 20A having a predetermined width isprepared (FIG. 4A and Step S1 in FIG. 5 ).

Cu Paste and Glass Paste Application Process

A Cu paste 23A is applied along the width direction W to two coatingpositions which are spaced apart by a constant distance in the lengthdirection L on the board main surface AK of the board 20A. Furthermore,a glass paste 25A forming the mark portion 25 is applied between the twocoating positions. Either application of the Cu paste 23A and the glasspaste 25A may be performed first (FIG. 4B and Step S2 in FIG. 5 ).

The Cu paste 23A may include, for example, a Cu powder and a binder.

The glass paste 25A may include, for example, a glass powder, an aluminapowder, and a binder. The application of the Cu paste 23A and theapplication of the glass paste 25A are performed by, for example, screenprinting.

The Cu paste 23A is applied to both surfaces of the board main surfaceAK1 in the vicinity of the electronic element of the board main surfaceAK and the board main surface AK2 in the vicinity of the circuit boardof the board main surface AK. At this time, the Cu paste 23A may beapplied thinner to the board main surface AK2 in the vicinity of thecircuit board than the board main surface AK1 in the vicinity of theelectronic element. In the present preferred embodiment of the presentinvention, the glass paste 25A is applied to the board main surface AK1in the vicinity of the electronic element. The glass paste 25A may beapplied thinner than the Cu paste 23A on the surface to be applied.

Board Firing Process

The board 20A is heated to fire the Cu paste 23A and the glass paste25A, thus forming the Cu fired layer 23 and the mark portion 25including Si (FIG. 4C and Step S3 in FIG. 5 ).

Through Hole Forming Process

The middle portion of the Cu fired layer 23 of the board 20A on whichthe Cu fired layer 23 and the mark portion 25 are fired is punched so asto penetrate in the thickness direction T, to form a through-hole 21Adefining and functioning as the recess (FIG. 4D and Step S4 in FIG. 5 ).

Cutting Process

Two locations where the Cu fired layer 23 is provided on the board 20Aare cut in a plane perpendicular or substantially perpendicular to thelength direction L to form the interposer board 20 including the Cufired layers 23 and the mark portion provided between the two locationswhere the Cu fired layers 23 are provided on the board main surface AKat both ends in the length direction L (FIG. 4E, and Step S5 of FIG. 5). The cutting may be performed by, for example, dicing or breaking.Dicing is a method of cutting using a dicer (dicing saw) that rotates athigh speed. Breaking is a method in which a groove is formed in advancein the board 20A, and the groove is split along the groove.

Debris Removing Process

Next, debris on the board side surface BK of the interposer board 20,which is cut and exposed, is removed (FIG. 4F and Step S6 of FIG. 5 ).

Zn-Containing Layer Forming Process

The Zn-containing layer 26 is formed on the board side surface BK of theinterposer board 20 from which debris is removed. The Zn-containinglayer forming process is, for example, a zincate treatment. Therefore,the Zn-containing layer forming process is a pretreatment process forobtaining a Zn-containing layer having favorable adhesion to aluminaincluding Al (aluminum), which is a less-noble metal than Zn. Ingeneral, when the board side surface BK is immersed in an aqueoussolution (zincate processing solution) in which Zn is dissolved, Aldissolves as ions because Zn has a more noble standardoxidation-reduction potential than Al. Electrons are generated at thistime, and Zn ions receive the electrons on the surface of the board sidesurface BK, to form the Zn-containing layer on the surface of the boardside surface BK (FIG. 4G, and Step S7 of FIG. 5 ). Since theZn-containing layer 26 is formed on the board side surface BK in thisway, the adhesion of the metal layers formed on the board side surfaceBK such as the Cu layer 27, the Ni plated layer 28, and the second Snplated layer 29 is improved.

Cu Layer Forming Process

The Cu layer 27 is formed on the outer periphery of the interposer board20 in the vicinity of the board end surface CK at both ends in thelength direction L (FIG. 4H, and Step S8 of FIG. 5 ). In the presentpreferred embodiment of the present invention, the Cu layer 27 is formedby Cu plating.

When the Cu plating is performed, since Zn is replaced by Cu, the Culayer 27 is easily adhered to the board end surface CK. However, the Culayer 27 is not limited to the plated layer. Here, not all Zn of theZn-containing layer is replaced, and a portion of Zn remains on theboard side surface BK, such that the Zn-containing layer 26 remainsthin.

Ni Plated Layer Forming Process

The Ni plated layer 28 is formed on the outer periphery of theinterposer board 20 where the Cu layer 27 is formed, in the vicinity ofthe board end surface CK at both ends in the length direction L (FIG. 4Hand Step S9 of FIG. 5 ).

Second Sn Plated Layer Forming Process

The second Sn plated layer 29 is formed on the outer periphery of theinterposer board 20 where the Ni plated layer 28 is formed, in thevicinity of the board end surface CK at both ends in the lengthdirection L (FIG. 4H and Step S10 of FIG. 5 ).

Next, a non-limiting example of a method of attaching the interposerboard 20 and the electronic element 10 will be described. FIGS. 6A-6Dare diagrams of a method of attaching the interposer board 20 and theelectronic element 10. FIG. 7 is a flowchart of a method of attachingthe interposer board 20 and the electronic element 10.

Jig Holding Process

The interposer board 20 in which the Cu layer 27, the Ni plated layer28, and the second Sn plated layer 29 are provided is provided and heldin a jig 100 including a plurality of recessed insertion portionstherein (FIG. 6A and Step S11 of FIG. 7 ).

Solder Providing Process

The cream solder 40A is provided on the board main surface AK1 of theinterposer board 20 in the vicinity of the electronic element which isone of the board main surfaces AK (FIG. 6B and Step S12 of FIG. 7 ).

Electronic Element Attaching Process

The electronic element 10 is provided on the board main surface AK1 inthe vicinity of the electronic element of the interposer board 20 onwhich the solder 40A is provided (FIG. 6C and Step S13 of FIG. 7 ).

First Sn Plated Layer Forming Process

The first Sn plated layer 30A is formed which covers both the externalelectrode 14 of the electronic element 10 and the metal layer of theinterposer board 20 (FIG. 6D and Step S14 of FIG. 7 ).

Advantageous Effects of First Preferred Embodiment

As described above, according to the first preferred embodiment of thepresent invention, the interposer board 20 is an alumina board. Aluminais generally harder than epoxy resin or the like, which is a commonmaterial for insulation boards. Therefore, it is possible to provide anelectronic component including the interposer board 20 that is resistantto deflection. In addition, alumina is harder than epoxy resin or thelike. This is also effective in reducing or preventing noise.

The width WK of the interposer board 20 is smaller than the width WS ofthe electronic element 10. The length LK of the interposer board 20 issmaller than the length LS of the electronic element 10. Therefore, theentire interposer board 20 is covered by the electronic element 10 in aplan view. Therefore, when mounting the interposer board 20 of theelectronic component 1 on the circuit board 90, the arrangement is notlimited due to the size of the interposer board 20. Furthermore, theinterposer board 20 is not visible in a plan view. For this reason, ithas excellent aesthetics.

Each of the pair of board end surfaces CK of the interposer board 20includes a recess 21. The recess 21 has a semi-elliptical orsubstantially semi-elliptical shape in a plan view as shown in FIG. 1 .By providing the recess 21, it is possible to accumulate a solder layer40 to join the lands 91 of the electronic component 1 and the circuitboard 90, in a space provided by the recess 21. Thus, it is possible toreduce or prevent wetting of the solder layer 40 on the end surface inthe length direction L of the electronic element 10.

The external electrodes 14 each include the electrically conductiveresin layer 14 b. The electrically conductive resin layer 14 b includesa thermosetting resin. For this reason, the electrically conductiveresin layer 14 b is more flexible than, for example, a metal layer madeof a plated film or a fired product of a conductive paste. Therefore,even when an impact caused by physical shock or thermal cycling on theelectronic component 1 is applied, the electrically conductive resinlayer 14 b defines and functions as a buffer layer. Thus, cracks in theelectronic component 1 are prevented from occurring. Furthermore, it iseasy to absorb piezoelectric vibration, and it is possible to reduce orprevent “noise”.

The Cu fired layer 23 is provided on the board main surface AK of theinterposer board 20 in the vicinity of the board end surface CK. By theCu fired layer 23 being provided in this way, the adhesion force of theCu plated layer provided on the outer periphery of the Cu fired layer 23to the board main surface AK of the interposer board 20 is improved.

The Cu fired layer 23 may be thinner from the board end surface CKtoward the middle portion along the length direction L on the board mainsurface AK. Therefore, when mounting the electronic element 10 on theinterposer board 20 using the solder 40A, the posture of the electronicelement 10 is easily stabilized.

The notches 22 are provided on the surface of the interposer board 20 inthe vicinity of the board end surface CK. The Cu fired layer 23, the Culayer 27, the Ni plated layer 28, the second Sn plated layer 29, thefirst Sn plated layer 30, or the like provided on the outer periphery ofthe interposer board may enter the interior of the notches 22 providedin the interposer board 20. This provides an anchoring effect. Due tothe anchoring effect, it is possible to increase the adhesive force ofthe Cu fired layer 23, the Cu layer 27, the Ni plated layer 28, thesecond Sn plated layer 29, and the first Sn plated layer 30, to theinterposer board 20.

The first Sn plated layer 30 is provided. The first Sn plated layer 30covers both the external electrode 14 of the electronic element 10 andthe metal layer of the interposer board 20. The first Sn plated layer 30is provided over the metal layer of the board end surface CK of theinterposer board 20 from the external electrode 14 of the electronicelement 10. Therefore, the first Sn plated layer 30 seamlessly connectsthe land 91 of the circuit board 90 and the external electrode 14 of theelectronic element 10. As a result, excellent conductivity can beensured.

The mark portion 25 is provided on the board main surface AK1 in thevicinity of the electronic element. As a result, the mark portion 25defines and functions as a mark to identify the board main surface AK1in the vicinity of the electronic element on which the Cu fired layer 23is provided thicker.

The mark portion 25 includes alumina. Therefore, it is possible tofirmly adhere to the interposer board 20 made of alumina.

The mark portion 25 is thinner than the Cu fired layer 23. Therefore,when mounting the electronic element 10 to the interposer board 20, themark portion 25 provided at the middle portion in the length direction Land the width direction W does not contact the electronic element 10.Thus, the mounting of the electronic element 10 does not becomeunstable.

When joining the electronic element 10 and the interposer board 20,there are cases where alignment using a camera is performed. In thesecases, photographing is performed from the side of the interposer board20. When the mark portion 25 is provided on the board main surface AK2in the vicinity of the circuit board, the mark portion 25 is visibleduring the alignment using a camera. Therefore, the alignment is easilyperformed.

The solder layer 40 includes the solder unfilled region 41. In thesolder unfilled region 41, the solder is not filled. The solder unfilledregion 41 defines and functions as the cavity region 41A, the fluxregion 41B, or the cushioning region 41C. The solder layer 40 includesthe solder unfilled region 41. With such a configuration, cushioningproperties can be provided between the electronic element 10 and theinterposer board 20. As a result, it is possible to reduce thetransmission of impact to the electronic element 10 when an impact actson the circuit board 90.

Before forming the metal layer on the board side surface BK of theinterposer board 20, the Zn-containing layer 26 is formed by theZn-containing layer forming process, which is a zincate treatment. Sincethe Zn-containing layer 26 is formed on the board side surface BK inthis way, the adhesion of the metal layers formed on the board sidesurface BK such as the Cu layer 27, the Ni plated layer 28, and thesecond Sn plated layer 29 is improved.

Second Preferred Embodiment

Next, a second preferred embodiment of the present invention will bedescribed. In the first preferred embodiment of the present invention,in the Zn-containing layer forming process in Step S7, the Zn-containinglayer 26 is formed on the board side surface BK of the interposer board20. In contrast, in the second preferred embodiment of the presentinvention, as Step S7, for example, a Pd (palladium)-containing layerforming process is performed, instead of the Zn-containing layer formingprocess. As a result, a Pd-containing layer 26 a shown as a commonportion with the Zn-containing layer 26 in FIG. 2 is formed. Theapplication of Pd is not limited to this. The application of Pd isperformed using, for example, the following (1) method of holding by anelastic body holder, or (2) method of holding by an adhesive layer.

(1) Method of Holding by Elastic Body Holder

FIG. 8 is a diagram of a non-limiting example of a method of holding theinterposer board 20 by an elastic body holder 201. The elastic bodyholder 201 is a plate-shaped member made of, for example, asilicone-based or fluorine-based rubber.

The elastic body holder 201 includes a holding hole 204 that receivesthe interposer board 20, for example, in the length direction L. Theinner dimension of the holding hole 204 may be smaller than thecross-sectional dimension of the interposer board 20. Therefore, whenthe interposer board 20 is inserted into the holding hole 204, theinterposer board 20 is held in close contact.

Next, for example, by sputtering as the dry plating method, the step ofadhering Pd on the board end surface CK of the interposer board 20 isperformed. In the case of sputtering, the elastic body holder 201 isopposed to the target 205. Then, in the interposer board 20 held by theelastic body holder 201, the metal particles are spattered toward theboard end surface CK facing the opening side of the holding hole 204, asindicated by the arrow. As a result, a metal film is formed on the boardend surface CK, such that Pd is formed.

(2) Method of Holding by Adhesive Layer

FIG. 9 is a diagram of a non-limiting example of a method of holding theinterposer board 20 by a holder 301 including an adhesive film 303. Theholder 301 includes a base material 302 and an adhesive film 303 made ofan elastic body such as, for example, silicon rubber. For example, achip aligner (not shown) is used to press the plurality of interposerboards 20 provided in line against the adhesive film 303. As a result,the interposer boards 20 are adhered to the adhesive film 303, andaligned with and held by each holder 301 as shown in FIG. 9 .

On the other hand, a Pd catalyst 305 is provided on a platen 304 with apredetermined thickness. The holder 301 holding the interposer board 20is brought close to the platen 304 with the interposer board 20 facingdownward, as indicated by the arrow. As a result, one of the board endsurfaces CK of the interposer board 20 is dipped into the Pd catalyst.The interposer board 20 is then lifted from the Pd catalyst. As aresult, a Pd film is formed on the board end surface CK of theinterposer board 20. Similarly, a Pd film is also formed on the otherone of the board end surfaces CK of the interposer board 20.

The Pd-containing layer is formed on the board side surface BK of theinterposer board 20 by using (1) the method of holding by the elasticbody holder or (2) the method of holding by the adhesive layer. Exceptfor the Pd including-containing layer forming process of Step S7, theprocesses are the same or substantially the same as those of the firstpreferred embodiment of the present invention. Therefore, theirdescriptions are omitted.

Also in the second preferred embodiment of the present invention, the Culayer 27 is formed after the Pd-containing layer forming process, as inthe first preferred embodiment of the present invention. However, in thesecond preferred embodiment of the present invention, the Cu layer 27 isformed by, for example, electroless plating. During Cu plating, althoughPd is replaced by Cu, not all Zn of the Pd-containing layer is replaced,and a portion of Pd remains on the board side surface BK, such that thePd-containing layer remains thin.

Also in the second preferred embodiment of the present invention, sincePd is replaced with Cu at the time of Cu plating, the adhesiveness ofthe Cu layer 27, the Ni plated layer 28, and the second Sn plated layer29, which are metal layers provided on the board side surface BK, isimproved as in the first preferred embodiment of the present invention.Furthermore, the other advantageous effects are the same orsubstantially the same as those of the first preferred embodiment of thepresent invention.

Third Preferred Embodiment

Next, a third preferred embodiment of the present invention will bedescribed. In the first preferred embodiment of the present invention,in the Zn-containing layer forming process of Step S7, the Zn-containinglayer is formed on the board side surface BK of the interposer board 20.In contrast, in the third preferred embodiment of the present invention,as Step S7, a Cu-containing layer forming process is performed, insteadof the Zn-containing layer forming process. As a result, a Cu-containinglayer 26 b shown as a common portion with the Zn-containing layer 26 inFIG. 2 is formed. The application of Cu is not limited to this. Theapplication of Cu is performed, for example, in the same orsubstantially the same manner as in the second preferred embodiment ofthe present invention using (1) the method of holding by the elasticbody holder or (2) the method of holding by the adhesive layer.

Using (1) the method of holding by the elastic body holder or (2) themethod of holding by the adhesive layer, the Cu-containing layer isformed on the board side surface BK of the interposer board 20. Exceptfor the Cu-containing layer forming process of Step S7, the processesare the same or substantially the same as those of the first preferredembodiment of the present invention. Therefore, their descriptions areomitted.

Also in the third preferred embodiment of the present invention, the Culayer 27 is formed by Cu plating after the Cu-containing layer formingprocess, as in the first preferred embodiment of the present invention.Therefore, the Cu-containing layer remains inside the Cu layer 27 formedby Cu plating.

Also in the third preferred embodiment of the present invention, sincethe Cu-containing layer is formed when performing Cu plating, theadhesiveness of the Cu layer 27, the Ni plated layer 28, and the secondSn plated layer 29, which are metal layers formed on the board sidesurface BK, is improved as in the first preferred embodiment of thepresent invention. Furthermore, the other advantageous effects are thesame or substantially the same as those of the first preferredembodiment of the present invention.

While preferred embodiments of the present invention have been describedabove, it is to be understood that variations and modifications will beapparent to those skilled in the art without departing from the scopeand spirit of the present invention. The scope of the present invention,therefore, is to be determined solely by the following claims.

What is claimed is:
 1. An electronic component comprising: an electronicelement; and an interposer board; wherein the electronic elementincludes: a rectangular or substantially rectangular multilayer bodyincluding dielectric layers and internal electrode layers which arealternately laminated, a pair of multilayer body end surfaces orthogonalor substantially orthogonal to the internal electrode layers, a pair ofmultilayer body side surfaces orthogonal or substantially orthogonal tothe multilayer body end surfaces, and a pair of multilayer body mainsurfaces orthogonal or substantially orthogonal to the multilayer bodyend surfaces and the multilayer body side surfaces; and externalelectrodes each on a respective one of the pair of multilayer body endsurfaces of the multilayer body and connected to the internal electrodelayers; the interposer board includes a pair of board end surfaces, apair of board side surfaces orthogonal or substantially orthogonal tothe board end surfaces, and a pair of board main surfaces orthogonal orsubstantially orthogonal to the board end surfaces and the board sidesurfaces; one of the pair of board main surfaces is located in avicinity of the electronic element and joined with one of the pair ofmultilayer body main surfaces in a vicinity of the interposer board; theinterposer board is an alumina board; and a mark portion is provided onone of the pair of board main surfaces.
 2. The electronic componentaccording to claim 1, wherein the mark portion is provided at a middleportion of the board main surface.
 3. The electronic component accordingto claim 1, wherein the mark portion includes Si and alumina.
 4. Theelectronic component according to claim 1, wherein a Cu fired layer isprovided on the one of the pair of board main surfaces in a vicinity ofboth ends of the interposer board, and the mark portion is thinner thanthe Cu fired layer.
 5. The electronic component according to claim 1,wherein the mark portion is provided on the one of the board mainsurfaces in the vicinity of the electronic element.
 6. The electroniccomponent according to claim 1, wherein the mark portion is provided onone of the board main surfaces in a vicinity of a circuit board.
 7. Theelectronic component according to claim 1, wherein the mark portion hasa circular, substantially circular, oval, substantially oval,triangular, or substantially triangular shape.
 8. The electroniccomponent according to claim 1, wherein the interposer board includes arecess in each of the pair of board end surfaces.
 9. The electroniccomponent according to claim 1, wherein, in the electronic element, alength between the pair of multilayer body end surfaces is about 2.01 mmto about 2.20 mm, a width between the pair of multilayer body sidesurfaces is about 1.30 mm to about 1.50 mm, a thickness between the pairof multilayer body main surfaces is about 1.70 mm to about 1.9 mm, athickness of each of the dielectric layers is about 0.4 μm to about 0.8μm, and a thickness of each of the internal electrode layers is about0.4 μm to about 0.8 μm.
 10. The electronic component according to claim1, wherein, in the electronic element, a length between the pair ofmultilayer body end surfaces is about 3.1 mm to about 3.3 mm, a widthbetween the pair of multilayer body side surfaces is about 1.5 mm toabout 2.7 mm, a thickness between the pair of multilayer body mainsurfaces is about 1.5 mm to about 2.7 mm, a thickness of each of thedielectric layers is about 0.4 μm to about 0.8 μm, and a thickness ofeach of the internal electrode layers is about 0.4 μm to about 0.8 μm.11. The electronic component according to claim 1, wherein each of theinternal electrode layers is in parallel or substantially in parallelwith the multilayer body main surfaces.
 12. The electronic componentaccording to claim 1, wherein each of the internal electrode layers isperpendicular or substantially perpendicular to the multilayer body mainsurfaces.
 13. The electronic component according to claim 1, whereineach of the external electrodes includes an electrically conductiveresin layer.
 14. The electronic component according to claim 13, whereineach of the external electrodes includes a Cu electrode layer betweenthe respective multilayer body end surface and the electricallyconductive resin layer; and each of the external electrodes includes agap between the Cu electrode layer and the electrically conductive resinlayer.
 15. The electronic component according to claim 1, wherein eachof the dielectric layers includes barium titanate as a main component.16. The electronic component according to claim 15, wherein each of thedielectric layers further includes at least one of Mn compounds, Fecompounds, Cr compounds, Co compounds and Ni compounds as asub-component.
 17. The electronic component according to claim 1,wherein each of the internal electrode layers includes Ni as a maincomponent.
 18. The electronic component according to claim 13, whereineach of the external electrodes includes a Ni plated layer on theelectrically conductive resin layer.
 19. The electronic componentaccording to claim 18, wherein each of the external electrodes includesan Sn plated layer on the Ni plated layer.
 20. The electronic componentaccording to claim 14, wherein each of the Cu electrode layers extendsonto a portion of each of the pair of multilayer main body main surfacesand the pair of multilayer body side surfaces.